发明名称 |
Plasma display device and method of producing the same |
摘要 |
A plasma display device comprises a first panel provided with discharge sustaining electrodes and a dielectric layer on the inside thereof, and a second panel laminated on the first panel so as to form discharge spaces on the inside, wherein the dielectric layer comprises a silicon oxide layer having a density of not less than 6.1x1022 atoms/cm3. Preferably, the density of the silicon oxide layer is not less than 6.4x1022 atoms/cm3. Where a sputtering method is used as a method of forming the silicon oxide layer, the concentration of oxygen gas in an atmosphere gas introduced into the sputtering apparatus is controlled to be 5 to 30 vol % during film formation. |
申请公布号 |
US2003030375(A1) |
申请公布日期 |
2003.02.13 |
申请号 |
US20020167396 |
申请日期 |
2002.06.13 |
申请人 |
NAKADA SATOSHI;EJIMA KAZUYUKI;MORI HIROSHI |
发明人 |
NAKADA SATOSHI;EJIMA KAZUYUKI;MORI HIROSHI |
分类号 |
H01J9/02;H01J11/02;H01J11/12;H01J11/22;H01J11/24;H01J11/26;H01J11/34;H01J11/38;H01J17/49;(IPC1-7):H01J17/49 |
主分类号 |
H01J9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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