| 摘要 |
The vacuum deposition apparatus includes a vacuum chamber, a plurality of evaporation positions set in the vacuum chamber and provided with film-forming materials in such a way that a film-forming material is placed at a evaporation position, a heating device for heating each of the film-forming materials, and arranged in correspondence with each of the plurality of evaporation positions, and a feeding device for feeding one of the film-forming materials into one of the plurality of evaporation positions during film deposition, and arranged in correspondence with at least one of the plurality of evaporation positions. Accordingly, the vacuum deposition apparatus is able to form a thick deposited film by multiple-source vacuum deposition independently heating two or more film-forming materials.
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