发明名称 |
SYNTHETIC QUARTZ GLASS AND METHOD OF MANUFACTURING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing synthetic quartz glass which is good in transmittability in a wavelength region below 165 nm in wavelength and is free of red emitted light occurring in F. SOLUTION: The synthetic quartz glass is manufactured by immersing the synthetic quartz glass in an aqueous solution containing porous silica, Al and F, then heating and clarifying the glass in such a manner that the Al and F contained in the synthetic quartz glass respectively attain >=2 <=9 ppm and >=1 to <100 ppm. The synthetic quartz glass manufactured in the manner described above is suitable for synthetic quartz glass for an F2 laser. |
申请公布号 |
JP2003026440(A) |
申请公布日期 |
2003.01.29 |
申请号 |
JP20010210330 |
申请日期 |
2001.07.11 |
申请人 |
SUMITOMO METAL IND LTD |
发明人 |
NISHIHARA KATSUHIRO;YAMAMOTO TOSHIRO |
分类号 |
G02B1/00;C03B8/04;C03B20/00;C03C3/06;C03C4/00;H01S3/034;(IPC1-7):C03C4/00 |
主分类号 |
G02B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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