发明名称 SYNTHETIC QUARTZ GLASS AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing synthetic quartz glass which is good in transmittability in a wavelength region below 165 nm in wavelength and is free of red emitted light occurring in F. SOLUTION: The synthetic quartz glass is manufactured by immersing the synthetic quartz glass in an aqueous solution containing porous silica, Al and F, then heating and clarifying the glass in such a manner that the Al and F contained in the synthetic quartz glass respectively attain >=2 <=9 ppm and >=1 to <100 ppm. The synthetic quartz glass manufactured in the manner described above is suitable for synthetic quartz glass for an F2 laser.
申请公布号 JP2003026440(A) 申请公布日期 2003.01.29
申请号 JP20010210330 申请日期 2001.07.11
申请人 SUMITOMO METAL IND LTD 发明人 NISHIHARA KATSUHIRO;YAMAMOTO TOSHIRO
分类号 G02B1/00;C03B8/04;C03B20/00;C03C3/06;C03C4/00;H01S3/034;(IPC1-7):C03C4/00 主分类号 G02B1/00
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