发明名称 |
Method of processing and plating wafers and other planar articles |
摘要 |
A wafer process methodology characterized by horizontal transport of vertically-oriented wafers into one or more process cells for performing vertical processing on the wafers. The process methodology also includes simultaneous processing of a plurality of vertically-oriented wafers at indexed positions along the horizontal transportation route. Additionally, the process methodology further includes loading of wafers onto carriers in a horizontal fashion and then rotating the carriers to orient the wafers vertically for transport and processing.
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申请公布号 |
US2003013285(A1) |
申请公布日期 |
2003.01.16 |
申请号 |
US20010907251 |
申请日期 |
2001.07.16 |
申请人 |
GRAMAROSSA DANIEL J.;DOWNES GARY C. |
发明人 |
GRAMAROSSA DANIEL J.;DOWNES GARY C. |
分类号 |
H01L21/288;H01L21/677;(IPC1-7):H01L21/20 |
主分类号 |
H01L21/288 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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