发明名称 Method of processing and plating wafers and other planar articles
摘要 A wafer process methodology characterized by horizontal transport of vertically-oriented wafers into one or more process cells for performing vertical processing on the wafers. The process methodology also includes simultaneous processing of a plurality of vertically-oriented wafers at indexed positions along the horizontal transportation route. Additionally, the process methodology further includes loading of wafers onto carriers in a horizontal fashion and then rotating the carriers to orient the wafers vertically for transport and processing.
申请公布号 US2003013285(A1) 申请公布日期 2003.01.16
申请号 US20010907251 申请日期 2001.07.16
申请人 GRAMAROSSA DANIEL J.;DOWNES GARY C. 发明人 GRAMAROSSA DANIEL J.;DOWNES GARY C.
分类号 H01L21/288;H01L21/677;(IPC1-7):H01L21/20 主分类号 H01L21/288
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