| 发明名称 |
Apparatus and method for coating a substrate by means of a chemical gas phase separation process |
| 摘要 |
In an apparatus for coating a substrate by means of a chemical gas phase separation process, the arrangement of the filaments (5, 17, 26) at least partially surrounding the substrate to be coated is not merely two-dimensional but three-dimensional in respect of the substrate.
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| 申请公布号 |
US2003010290(A1) |
申请公布日期 |
2003.01.16 |
| 申请号 |
US20020086190 |
申请日期 |
2002.02.28 |
| 申请人 |
MATTHEE THORSTEN;SIX ROLF;HAMPEL ALEXANDER |
发明人 |
MATTHEE THORSTEN;SIX ROLF;HAMPEL ALEXANDER |
| 分类号 |
C23C16/44;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/44 |
| 代理机构 |
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