发明名称 |
PAD CONDITIONER OF POLISHING DEVICE FOR SEMICONDUCTOR |
摘要 |
PURPOSE: A pad conditioner of polishing device for semiconductor is provided to inspect whether the transmission unit of turning force and air pressure function normally or not so that the conditioning efficiency can be maintained stable. CONSTITUTION: A rotation motor(213), a swing motor(214) for the motion of a housing(210) and an external air supplying pipe are installed on the one end of a conditioner(200) combined to CMP base body through an axis. A conditioning head(260) is combined to the other end of the conditioner through a fully(250). Two supporting rod is installed between the both end of the housing, on one of which, a rotation detection sensor(280) is mounted to examine the state of the rotation of the conditioner. A pressure sensor(290) near the air supplier(232) inspects whether the air pressure is appropriate for the pad conditioning. |
申请公布号 |
KR20030002777(A) |
申请公布日期 |
2003.01.09 |
申请号 |
KR20010038481 |
申请日期 |
2001.06.29 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHOI, BONG;CHOI, JAE HUN |
分类号 |
B24B53/02;B24B37/00;B24B37/04;B24B53/007;B24B53/017;B24B53/14;H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
B24B53/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|