METHOD FOR FABRICATING TEST PATTERN OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for fabricating a test pattern of a semiconductor device is provided to prevent an error in a pattern test and to improve reliability of in-line monitoring by leaving a plurality of insulation materials of an independent line type between conductive material in a pad area. CONSTITUTION: A conductive material is formed in a pad formation region of a semiconductor substrate. An insulation material of a mesh type is formed in the pad formation region, or the conductive material is formed after an interlayer dielectric(42) in the pad formation region is left as a mesh type.