| 摘要 |
PURPOSE: A counter for accumulated layer in CVD(Chemical Vapor Deposition) facility is provided to facilitate and stabilize the management of accumulated layer by evaluating and displaying the total quantity of reaction gas supplied and improve production yield by fixing in time. CONSTITUTION: A counter(100) includes a MFC sensing unit(110), a valve sensing unit(120), an evaluation unit(130) and a display unit(140). The MFC sensing unit installed in the pipeline for reaction gas outputs electric signal proportional to the quantity of gas flow predetermined by MFC controller. The gap of a control valve inside the unit is adjusted depending on the predetermined value. The valve sensing unit outputs electric signal sensing the opening time of the valve. The evaluation unit evaluates the total accumulated quantity of reaction gas supplied, multiplying the quantity of gas flow by the opening time of the valve, which is shown on the display unit.
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