| 摘要 |
PROBLEM TO BE SOLVED: To suppress a decrease in strength of an exposure light between a projection optical system and a photosensitive substrate, and to suppress the nonuniformity of impurity concentration therebetween to the minimum. SOLUTION: A shielding member 9 for shielding almost the entire region of an optical path of an exposure light between a projection optical system 6 and the vicinity of a wafer W from an external atmosphere is provided in a space between the system 6 and the wafer W. The member 9 is closely mounted on the system 6, an opening 20 is made on the member 9 mounted on the system 6 to allow an exposure light to pass through the opening 20, and a temperature-adjusted nitrogen is jetted from the opening 20 toward the wafer W.
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