发明名称 MULTI−LAYER FILM SPECTROSCOPIC ELEMENT FOR BORON FLUORESCENCE X−RAY ANALYSIS
摘要 <p>A multi−layer film spectroscopic element sufficiently high in reflection intensity of the B−Kαline for boron X−ray fluorescent analysis conducted in a short time with high accuracy while sufficiently reducing the effect of the interfering line and background.In the multi−layer spectroscopic element(3),a reflection layer(31)is formed of lanthanum(La),an alloy mainly consisting of lanthanum,or a lanthanum oxide(La<sb>2</sb>O<sb>3</sb>),a spacer layer(32)is formed of boron(B),the periodic length(d)is 7−14 nm,and the film thickness ratio of the reflection layer(31)to the spacer layer(32)is 2/3 to 3/2.The element has a total film thickness(t)such that the reflection intensity of the B−Kαline is not less than 98% of the saturation value.</p>
申请公布号 WO02101368(A1) 申请公布日期 2002.12.19
申请号 WO2002JP05317 申请日期 2002.05.30
申请人 RIGAKU INDUSTRIAL CORPORATION;SHIMIZU, KAZUAKI 发明人 SHIMIZU, KAZUAKI
分类号 G01N23/223;G21K1/06;(IPC1-7):G01N23/223 主分类号 G01N23/223
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