发明名称 METHOD FOR MANUFACTURING ANALYZING ELEMENT AND ANALYZING ELEMENT AS WELL AS METHOD FOR ANALYZING SAMPLE USING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To facilitate a control of a structure of a diffraction grating and a control of properties of a surface contacted with a sample as an optical structure for inducting an evanescent wave in a method for manufacturing an analyzing element for analyzing the sample utilizing a surface plasmon resonance(SPR). SOLUTION: A method for manufacturing the analyzing element comprises the steps of forming a diffraction grating 25 in a mold 24, laminating a metal film 23 on a surface of the mold 24 at the side formed with the grating 25, further laminating a substrate 22 on the film 23, and thereby excluding an element by vapor depositing and sputtering from an operation at the time of forming the grating 25 on the surface of the film 23 in the steps of manufacturing the element 21.</p>
申请公布号 JP2002357537(A) 申请公布日期 2002.12.13
申请号 JP20010167167 申请日期 2001.06.01
申请人 MITSUBISHI CHEMICALS CORP 发明人 ISOMURA SATORU;MUNEBAYASHI TAKAAKI;OOHIRAOCHI YOSHIHIRO
分类号 G01N33/543;G01N21/27;G01N21/41;(IPC1-7):G01N21/27 主分类号 G01N33/543
代理机构 代理人
主权项
地址