ION DOPING EQUIPMENT AND CONTROL METHOD OF DOSING AMOUNT TO BE USED FOR SAME

摘要

PROBLEM TO BE SOLVED: To provide an ion doping equipment with which ion amount of required impurities can be precisely controlled at ion doping process. SOLUTION: A fixed faraday to measure dosing amount is arranged on the periphery of a glass substrate of a susceptor retaining the substrate. It is so designed that a dosing amount of required impurities can be precisely measured during ion-doping treatment by attaching to the fixed faraday an electromagnet or a permanent magnet which enables separation of mass.