发明名称 |
PLASMA PROCESSING DEVICE |
摘要 |
A plasma processing device comprises a processing chamber having a dielectric wall, and a mounting table disposed in the processing chamber and having a mounting surface on which work is mounted. It is arranged that induction plasma is exited in the processing chamber through the dielectric wall. A dielectric member is installed that is capable of removably covering at least the mounting surface of the mounting table.
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申请公布号 |
WO02099863(A1) |
申请公布日期 |
2002.12.12 |
申请号 |
WO2002JP05367 |
申请日期 |
2002.05.31 |
申请人 |
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发明人 |
IKEDA, TARO;IIZUKA, HACHISHIRO;YAMAMOTO, KAORU |
分类号 |
H01J37/32;(IPC1-7):H01L21/306 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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