METHOD OF MANUFACTURING SEMICONDUCTOR THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor thin film which can prevent a contamination of an interface. SOLUTION: An ozone water washing 14 is performed immediately after an amorphous silicon 13 is deposited on a glass substrate 11 to compulsorily form an oxide film 15 on the surface of the amorphous silicon film 13 so that the contamination of the amorphous silicon film 13 is prevented.