METHOD FOR REMOVING TITANIUM-BASED CONTAMINATIVE LAYER DEPOSITED ON BASIC MATERIAL OF TITANIUM COLLIMATOR BY USING SACRIFICIAL LAYER

摘要

PURPOSE: A method for removing a titanium-based contaminative layer deposited on a basic material of a titanium collimator by using a sacrificial layer is provided to remove selectively titanium and titanium nitride without a damage of the basic material by coating a sacrificial layer on a collimator and etching selectively only the sacrificial layer. CONSTITUTION: Titanium and titanium nitride(1) are deposited on a collimator. A sacrificial layer(2) is used for performing an etching process. The sacrificial layer(2) is not separated easily from a basic material(3) of a collimator by an external physical variation and an external thermal variation since the sacrificial layer(2) has an excellent adhesive strength and a low thermal expansion coefficient. The collimator is coated without generating an outgassing phenomenon since the collimator is used under a state of high vacuum. The collimator has thickness enough for removing the titanium and the titanium nitride(1).