发明名称 Test reticle for proximity characterizing of scanner lenses in lithography technology
摘要 On the test reticle are located modules (1), contg. cells (3) in which are fitted lines of given width and spacing in different orientation. Preferably on both sides of mask middle line (M) of reticle are arranged middle line modules alternating in Z and Y direction. In the region of mask middle line the middle line modules extend in Y-direction over the entire width (5) of the scanner slit. The middle line modules of different orientation are point-symmetrically arranged w.r.t. reticle Center point (Z). Independent claims are included for method of proximity characterizing of scanner lenses.
申请公布号 DE10124736(A1) 申请公布日期 2002.12.05
申请号 DE2001124736 申请日期 2001.05.21
申请人 INFINEON TECHNOLOGIES AG 发明人 ANKE, INES;HASMANN, JENS
分类号 G03F1/00;G03F7/20 主分类号 G03F1/00
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