发明名称 |
Novel tetrahydrofuran compounds having alicyclic structure |
摘要 |
Tetrahydrofuran compounds of formula (1) wherein the broken line represents a single bond, a divalent organic group, or a structure in which the alicyclic structure in the form of norbornene or tetracyclo[4.4.0.12,5.17,10]dodecene and the tetrahydrofuran cyclic structure share one or two constituent carbon atoms, and k is 0 or 1 are novel and useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography.
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申请公布号 |
US2002183529(A1) |
申请公布日期 |
2002.12.05 |
申请号 |
US20020117218 |
申请日期 |
2002.04.08 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KINSHO TAKESHI;HASEGAWA KOJI;WATANABE TAKERU |
分类号 |
C07D307/93;C07D307/06;C07D307/12;C07D307/94;C08F32/00;C08G61/08;G03F7/004;(IPC1-7):C0737/12;C0737/06 |
主分类号 |
C07D307/93 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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