发明名称 |
METHOD FOR MANUFACTURING SAMPLE FOR OBSERVING CRYSTAL DEFECT IN SILICON CRYSTAL AND THIN PIECE SAMPLE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a sample which can form at once a large quantity of thin piece samples for a crystal defect observing transmission electron microscope in the silicon crystal and which can be simply manufactured in a wide area and to provide the thin piece sample. SOLUTION: The method for manufacturing the sample to observe the defect in the silicon crystal by the transmission electron microscope comprises the steps of releasing only a shallow region on the surface of the crystal, and thinning the region to the thin piece samples.
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申请公布号 |
JP2002343841(A) |
申请公布日期 |
2002.11.29 |
申请号 |
JP20010146943 |
申请日期 |
2001.05.16 |
申请人 |
SHIN ETSU HANDOTAI CO LTD |
发明人 |
KATO MASAHIRO;YOKOGAWA ISAO |
分类号 |
G01N1/28;H01J37/20;H01L21/66;(IPC1-7):H01L21/66 |
主分类号 |
G01N1/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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