发明名称 |
RESIN COMPOSITION FOR DIRECT PLATING, RESIN PLATING METHOD, AND PLATED RESIN ARTICLE |
摘要 |
PROBLEM TO BE SOLVED: To provide a resin composition for direct plating which is excellent in properties in direct plating, especially extensibility of electroplated copper, and in impact resistance; a resin plating method using the same; and a plated resin article prepared by using the same. SOLUTION: This resin composition for direct plating contains (C) a graft copolymer formed by the graft polymerization of (b) a monomer component containing an aromatic vinyl compound and a vinyl cyanide compound onto (a) a rubbery polymer having an average particle size of 0.2-0.5μm and containing 5-20 mass% particles having particle sizes of 0.8-1.5μm. The resin plating method comprises subjecting a molded article obtained by molding the resin composition to a Pd-Sn colloid catalyst treatment, then to a conductivity-imparting treatment, and to direct electroplating without subjecting to an accelerator treatment and nonelectrolytic plating after the Pd-Sn colloid catalyst treatment. The plated resin article is obtained by the resin plating method.
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申请公布号 |
JP2002338636(A) |
申请公布日期 |
2002.11.27 |
申请号 |
JP20010152827 |
申请日期 |
2001.05.22 |
申请人 |
MITSUBISHI RAYON CO LTD |
发明人 |
SAKAI HIROSHI;FUJII SEIZO |
分类号 |
C08J7/06;C08F279/04;C08L25/12;C08L51/04;(IPC1-7):C08F279/04 |
主分类号 |
C08J7/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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