METHOD FOR HOLDING SUBSTRATE AND SUBSTRATE HOLDING SYSTEM

摘要

PURPOSE: A method for holding a substrate is provided to reduce the quantity of foreign substances on the back surface of a substrate and decrease foreign substances transferred from an install unit to the substrate, by making the substrate contact the cooling surface at the ring-shaped leakage-proof surface, by placing the contact holding portion on a position inside the ring-shaped leakage-proof surface and by allowing the back surface of the substrate not to contact the cooling surface in the large portion of the remaining area. CONSTITUTION: The ring-shaped leakage-proof surface has a smooth surface on the specimen table corresponding to the periphery of the substrate(1). A plurality of contact holding portions confront the substrate on the specimen table between a position corresponding to the periphery of the substrate and a position corresponding to the center of the substrate. An electrostatic attraction unit fixes the substrate by making the back surface of the substrate contact the ring-shaped leakage-proof surface.