发明名称 Optical modeling device and exposure unit
摘要 When a first position of an exposure unit is determined by an XY positioning mechanism, a micromirror of a digital micromirror device is on/off controlled in accordance with image data within a region of a predetermined area including the first position, a light beam emitted from a light source enters the digital micromirror device, through an optical fiber and a homogenizer optical system, and modulated per each data in accordance with image data. A light beam transmitted to a reflective mirror is condensed by a condensing lens, then reflected from the reflected mirror onto a surface of a photo-curable resin, a portion within a region of a predetermined area of the photo-curable resin surface is exposed by the light beam, and the exposed portion is cured. In the same manner, the entire resin surface is exposed by repeating movement and/or exposure of the exposure unit.
申请公布号 US2002164069(A1) 申请公布日期 2002.11.07
申请号 US20020074258 申请日期 2002.02.14
申请人 FUJI PHOTO FILM CO., LTD. 发明人 NAGANO KAZUHIKO;OKAZAKI YOJI
分类号 B29C35/08;B29C67/00;(IPC1-7):G06K9/00 主分类号 B29C35/08
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