发明名称 |
APPARATUS FOR LIFTING AND FALLING HEATER BLOCK OF CHEMICAL VAPOR DEPOSITION EQUIPMENT |
摘要 |
PURPOSE: A heater block lifting and falling apparatus of a CVD(Chemical Vapor Deposition) equipment is provided to prevent abrupt lifting of the heater block by forming a stopper at the lower portion of the heater block. CONSTITUTION: A heater block(23) is formed in a processing chamber(21) for loading a wafer(W). A shower head(25) is located on the processing chamber(21) for spraying processing gases into the wafer(W). A driving unit(30) for lifting and falling the heater block(23) includes a motor(33), a lead screw(35) and a lead screw fixing plate(37). A stopper(39) is formed on the lead screw(35) for restraining abrupt lifting of the heater block(23), thereby preventing a breakage of the heater block(23) and the shower head(25).
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申请公布号 |
KR20020080132(A) |
申请公布日期 |
2002.10.23 |
申请号 |
KR20010019335 |
申请日期 |
2001.04.11 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, GI YONG |
分类号 |
H01L21/205;(IPC1-7):H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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