发明名称 APPARATUS FOR LIFTING AND FALLING HEATER BLOCK OF CHEMICAL VAPOR DEPOSITION EQUIPMENT
摘要 PURPOSE: A heater block lifting and falling apparatus of a CVD(Chemical Vapor Deposition) equipment is provided to prevent abrupt lifting of the heater block by forming a stopper at the lower portion of the heater block. CONSTITUTION: A heater block(23) is formed in a processing chamber(21) for loading a wafer(W). A shower head(25) is located on the processing chamber(21) for spraying processing gases into the wafer(W). A driving unit(30) for lifting and falling the heater block(23) includes a motor(33), a lead screw(35) and a lead screw fixing plate(37). A stopper(39) is formed on the lead screw(35) for restraining abrupt lifting of the heater block(23), thereby preventing a breakage of the heater block(23) and the shower head(25).
申请公布号 KR20020080132(A) 申请公布日期 2002.10.23
申请号 KR20010019335 申请日期 2001.04.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, GI YONG
分类号 H01L21/205;(IPC1-7):H01L21/205 主分类号 H01L21/205
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