发明名称 INJECTION SEEDED F2 LASER WITH PRE-INJECTED FILTER
摘要 A narrow band F2 laser system useful for integrated circuit lithography. An output beam from a first F2 laser gain medium (master oscillator) is filtered with a pre-gain filter to produce a seed beam having a bandwidth of about 0.1 pm or less. The seed beam is amplified in a power gain stage which includes a second F2 laser gain medium. The output beam of the system is a pulsed laser beam with a full width half maximum band width of about 0.1 pm or less with pulse energy in excess of about 5 mJ. In a preferred embodiment the pre-gain filter includes a wavelength monitor that permits feedback control over the centreline wavelength so that the pre-gain filter optics can be adjusted to ensure that the desired bandwidth range is injected into the power gain stage.
申请公布号 WO02082598(A1) 申请公布日期 2002.10.17
申请号 WO2002US10734 申请日期 2002.04.04
申请人 CYMER, INC.;SANDSTROM, RICHARD, L.;PARTLO, WILLIAM, N.;ONKELS, ECKEHARD, D. 发明人 SANDSTROM, RICHARD, L.;PARTLO, WILLIAM, N.;ONKELS, ECKEHARD, D.
分类号 H01L21/027;G03F7/20;H01S3/03;H01S3/036;H01S3/038;H01S3/041;H01S3/08;H01S3/0943;H01S3/097;H01S3/0971;H01S3/102;H01S3/139;H01S3/22;H01S3/223;H01S3/225;H01S3/23;(IPC1-7):H01S3/10;H01S3/13 主分类号 H01L21/027
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