发明名称 Laser irradiation apparatus
摘要 [Summary][Object]An object is to obtain an even energy distribution of a laser beam in one direction, thereby conducting a uniform laser annealing on a film. [Solving Means]A laser irradiation apparatus comprising: a lens for dividing a laser beam in one direction; and an optical system for overlapping the divided laser beam, characterized in that the shape of the laser beam entering into the lens has edges vertical to the above-mentioned direction.
申请公布号 US2002151121(A1) 申请公布日期 2002.10.17
申请号 US20020136374 申请日期 2002.05.02
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 TANAKA KOICHIRO
分类号 H01L21/26;B23K26/06;B23K26/067;B23K26/073;G02B27/09;H01S3/0941;(IPC1-7):H01L21/00;H01L21/84;H01S3/08 主分类号 H01L21/26
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