发明名称 Semiconductor device
摘要 A small-sized low-power-loss capacitor having low parasitic resistance is obtained by adopting metal wires as wires in a line and space structure to utilize capacitances between adjacent metal wires. A plurality of wires (3) each extending in a direction (x) and composed of metals such as Al and Cu are aligned in a direction (y) at predetermined intervals, forming a line and space structure (4). The line and space structure (4) is formed on a silicon substrate (1). On the silicon substrate (1), an insulation film (2) composed for example of a silicon oxide film is formed to provide electrical isolation between adjacent wires (3).
申请公布号 US6465832(B1) 申请公布日期 2002.10.15
申请号 US20000543544 申请日期 2000.04.05
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MAEDA SHIGENOBU;YAMAMOTO KAZUYA
分类号 H01L27/04;H01L21/02;H01L21/822;H01L23/522;H01L27/08;H01L27/108;(IPC1-7):H01G4/30;H01L29/00 主分类号 H01L27/04
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