发明名称 PLASMA PROCESSING DEVICE
摘要 <p>A micro wave plasma processing device having a radial line slot antenna capable of suppressing an abnormal discharge to increase the exciting efficiency of micro wave plasma, wherein the tip part of a power supply line in a coaxial wave guide is separated from a slot plate forming a radiating surface at a connection part between the radial line slot antenna and the coaxial wave guide.</p>
申请公布号 WO2002080248(P1) 申请公布日期 2002.10.10
申请号 JP2002003107 申请日期 2002.03.28
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址