| 摘要 |
PROBLEM TO BE SOLVED: To provide a planar galvano device minimizing the occurrence of the warp of a movable plate due to coil, insulation film and protective film formation on the upper surface of the movable plate or the like, and the manufacturing method. SOLUTION: For the planar galvano device, the film of strong tensile stress is formed on the same surface as a reflection mirror surface. The manufacturing method of the planar galvano device has a process for thermally oxidizing the upper and lower surfaces of a silicon stuck substrate (SOI substrate) and forming a silicon oxide film, a process for laminating the respective patterns of a coil (30), an insulation film (31) and a protective film 32 by photolithography on a substrate upper surface side, a process for removing a supporting substrate (silicon) reaching an intermediate layer by anisotropic etching, a process for removing the intermediate layer remaining on a movable plate lower surface by dry etching, a process for forming a reflection mirror on an exposed silicon surface and a process for forming a film of the strong tensile stress as the base of the reflection mirror surface.
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