| 摘要 |
<p>PROBLEM TO BE SOLVED: To solve the problem in diagnosing the flow rate of a flow control device wherein flow diagnosis is required at the intermission of the processing of a body to be processed, such as, for example, the switching time of a lot, the starting time of a device or the like, by providing a process exclusive for the flow diagnosis, and a throughout is lowered. SOLUTION: In this processing device, when process gas is supplied into a chamber 30 at a prescribed flow rate and a wafer W is processes in the chamber 30, the flow rate of the process gas is diagnosed at every processing time of the wafer W by the process gas.</p> |
