发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a semiconductor device where the growth of microcracks is prevented. SOLUTION: The semiconductor device comprises a semiconductor substrate 1, having a surface provided with a circuit element and pads and a backside provided with a groove 4 at its periphery, and a mounting substrate 2 where the surface of this semiconductor substrate 1 is adhered to its surface and connection terminals 8 electrically connected to the pads are provided on its backside.</p>
申请公布号 JP2002289740(A) 申请公布日期 2002.10.04
申请号 JP20010084326 申请日期 2001.03.23
申请人 TOSHIBA CORP 发明人 AZUMA IKUYA;OZAWA ISAO
分类号 B23K26/00;B23K101/40;H01L21/301;H01L23/12;(IPC1-7):H01L23/12 主分类号 B23K26/00
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