发明名称 PLASMA PROCESSOR AND PLASMA PROCESSING METHOD
摘要 A spiral line with an interval (d) approximately N times (N is a natural number) the wavelength lambda g of an electromagnetic field in a radial antenna (30) has slots (36) of the radial antenna (30) for feeding the electromagnetic field into a processing container. An electromagnetic field is fed from the central section of this radial antenna (30) at a rotation mode.
申请公布号 WO02078072(A1) 申请公布日期 2002.10.03
申请号 WO2002JP02627 申请日期 2002.03.19
申请人 TOKYO ELECTRON LIMITED;ISHII, NOBUO;ANDO, MAKOTO;TAKAHASHI, MASAHARU;YASAKA, YASUYOSHI 发明人 ISHII, NOBUO;ANDO, MAKOTO;TAKAHASHI, MASAHARU;YASAKA, YASUYOSHI
分类号 H05H1/46;B01J19/08;H01J37/32;H01L21/302;H01L21/306;H01L21/3065;H01L21/31;(IPC1-7):H01L21/306 主分类号 H05H1/46
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