发明名称 EXCIMER RADIATOR, ESPECIALLY UV RADIATOR
摘要 PURPOSE: An excimer radiator, especially an UV radiator is provided which maintains a sufficient stabilization of an annealing process without external cooling. CONSTITUTION: In an excimer radiator, especially an UV radiator with dielectrically impeded discharge, the first electrode is applied in a discharge chamber sealed from the ambient atmosphere onto an elongated support which, as seen in a radial direction from its longitudinal axis, is surrounded by a discharge vessel of quartz defining the discharge chamber, on the outside of the discharge vessel a second electrode is disposed which is permeable to at least a portion of the radiation produced in the discharge chamber. In order to maintain sufficient stability in the incandescent processes necessary in the manufacture of the radiator in spite of the elongated internal electrode, one end of a support(8) of the first electrode is placed and affixed in a hollow body-like section(5) tapering as seen in longitudinal section, while the other end of the support is connected to a base(11) which has at least one current lead-through(16) for the first electrode(9).
申请公布号 KR20020073385(A) 申请公布日期 2002.09.26
申请号 KR20020013006 申请日期 2002.03.11
申请人 HERAEUS NOBLELIGHT GMBH 发明人 SILKE REBER
分类号 H01J65/00;H01J65/04;(IPC1-7):H01S3/225 主分类号 H01J65/00
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