发明名称 |
Method for grading surface topography for improved step coverage and planarization |
摘要 |
A method is provided for grading the surface topography of a surface to improve step coverage for an overcoat. In accordance with one aspect of the present invention, an ABS of a slider and sensitive element of a magnetic head is graded to provide better step coverage of an overcoat of ultra-thin DLC film. After lapping the ABS, a thin film is deposited on the lapped surface to cover any scratches, irregularities, and steps. The thin film is sputter etched at a glancing angle to grade the topography of the slider ABS. Sputtering at a glancing angle removes the thin film in planar regions faster than the thin film under the shadow of the glancing angle, which is near surface irregularities. The graded surface is then covered by a DLC deposition.
|
申请公布号 |
US2002134672(A1) |
申请公布日期 |
2002.09.26 |
申请号 |
US20010812608 |
申请日期 |
2001.03.20 |
申请人 |
HWANG CHERNGYE;ROW EUN KYOUNG;SHI NING |
发明人 |
HWANG CHERNGYE;ROW EUN KYOUNG;SHI NING |
分类号 |
C23C14/02;C23C16/02;G11B5/31;G11B5/60;(IPC1-7):C23C14/32;G11B5/127 |
主分类号 |
C23C14/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|