PLASMA TREATING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a plasma treating apparatus having a high utilization efficiency of high frequency power. SOLUTION: A baffle plate 24 is fitted between the ceiling and sidewall defining the chamber 2 of the plasma treating apparatus. The baffle plate 24 has a function for confining a plasma above the chamber 2 and a function as the passage of a current returning back to a high frequency power supply. In the arrangement provided with the baffle plate 24, interface on the return passage is reduced substantially and plasma treatment with a high utilization frequency of high frequency power can be realized.