SOLVENT FOR PHOTORESIST, METHOD FOR PRODUCING THE SAME AND PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To increase the long-term storage stability of a photoresist composition obtained by dissolving an alkali-soluble resin and a radiation sensitive compound in a solvent and to provide a solvent for the increase and a method for producing the solvent. SOLUTION: The stability of a photoresist composition obtained by dissolving an alkali-soluble resin and a radiation sensitive compound in a solvent is increased by incorporating a secondary or tertiary alcohol having two alkoxy groups in one molecule or one or more of its carboxylic ester derivatives as the solvent.