发明名称 FAR INFRARED RAY DRYING DEVICE, DRYING DEVICE CONSITUTING BODY, AND DRYING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To prevent the occurrence of breaking of a wire to a fine wiring pattern at a lithography process carried out at an after process for a print substrate by rapidly discharging a solvent in resist ink to the atmosphere from the surface of a print substrate in a state to radiate far infrared rays to resist ink coated on the print substrate. SOLUTION: Far infrared rays of a wave length of approximate 3-approximate 6μm is radiated from a far infrared ray radiation layer, having a metal surface, to the print substrate. A pressure medium is sprayed against the substrate such that the temperature of an object to be dried is reduced to 180 deg.C or less.</p>
申请公布号 JP2002267356(A) 申请公布日期 2002.09.18
申请号 JP20010116107 申请日期 2001.03.12
申请人 DAITO SEIKI CO LTD 发明人 SUZUKI AKIRA
分类号 G03F7/20;F26B3/04;F26B3/30;F26B15/18;F26B21/04;F26B21/10;H05K3/00;H05K3/06;(IPC1-7):F26B3/30 主分类号 G03F7/20
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