| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in aptness for halftone exposure, hole pitch dependency and margin for exposure, capable of preventing a sensitivity change due to storage with age, excellent in PED stability and excellent also in uniformity of reduction in film thickness when a resin is etched with an oxide. SOLUTION: The positive resist composition contains a resin having repeating units with a specified alicyclic lactone structure, further having an alicyclic hydrocarbon group and having a velocity of dissolution in an alkali developing solution increased by the action of an acid and at least two specified compounds which generate acids when irradiated with active light or radiation. |
