| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing metal wiring, capable of obtaining a wide and low resistant metal wire with existing manufacturing equipment. SOLUTION: A hard mask layer, having a first wiring pattern, is formed on a substrate whereon a metal layer is formed, a spacer is formed on the sidewall of the hard mask layer, and the metal layer is etched with a etching mask, comprising the hard mask layer and the spacer. A second wiring pattern is formed with its wire width wider than that of the first wiring pattern due to the remaining metal layer.
|
