| 摘要 |
PROBLEM TO BE SOLVED: To provide an overlapping error measuring method for calculating the true value M of a precise overlapping error with a resist pattern for forming a lower layer pattern and an upper layer pattern, even if the optical axis is deviated. SOLUTION: A first overlapping error measurement mark 100 having a recessed lower mark 11A and a first upper layer mark 13A, and a second overlapping error measurement mark 200 having a projecting lower layer mark 11B and a second upper layer mark 13B are arranged on the same substrate 10, and first and second overlapping error measurement marks 100 and 200 measure the overlapping error. |
