发明名称 PREPARATION OF LOW RESIDUAL MONOMER CONTENT POLYMERS.
摘要 <p>Methods of preparing an acrylic polymer according to the present invention comprise the steps of: forming a gelled polymer by polymerizing a mixture containing an acrylic monomer and a photoinitiator; comminuting the gelled polymer to produce gel particles; and irradiating the gel particles with light to decompose the photoinitiator, simultaneously with, or after, the step of comminuting. The gel particles may be irradiated with UV light while they are being dried in a fluid bed dryer.</p>
申请公布号 MXPA02003363(A) 申请公布日期 2002.08.23
申请号 MX2002PA03363 申请日期 2000.09.18
申请人 CYTEC TECHNOLOGY CORP. 发明人 DOUGLAS A. CYWAR.
分类号 C08F2/48;C08F2/50;C08F4/04;C08F6/00;C08F20/00;(IPC1-7):C08F6/00 主分类号 C08F2/48
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