DISC-TYPE APPARATUS FOR DEVELOPING PHOTORESIST LAYER

摘要

PURPOSE: A disc-type apparatus for developing a photoresist layer is provided to improve developing uniformity by simultaneously applying developer on the entire surface of a wafer, and to shorten an interval of a developing process by omitting a process for horizontally transferring a developing nozzle. CONSTITUTION: The disc-type apparatus for developing the photoresist layer has the same size as the wafer(10). The disc-type apparatus for developing the photoresist layer is composed of a nozzle for spraying the developer on the entire surface of the wafer, vertically controlled in a position corresponding to the wafer.