发明名称 HOLDING DEVICE, HOLDING METHOD, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
摘要 <p>A holding device, comprising a reticle holder (18) having a first suction part (63) opposed to an accuracy assurance area (AR1) having a specified surface accuracy of the lower surface (Ra) of a reticle (R), a second suction part (64) opposed to an accuracy non-assurance area (AR2) other than the accuracy assurance area (AR1), a small hole (70a) connected to a suction device for sucking the gas in a space between the lower surface (Ra) of the reticle (R) and the first suction part (63), and a small hole (70b) connected to a suction device (72) for sucking the gas in a space between the lower surface (Ra) of the reticle (R) and the second suction part (64), whereby the reticle can be held stably without deteriorating the surface accuracy of the accuracy assurance area.</p>
申请公布号 WO2002065519(P1) 申请公布日期 2002.08.22
申请号 JP2002001200 申请日期 2002.02.13
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