| 发明名称 |
FILM FORMING GAS AND PLASMA FILM-FORMING METHOD |
| 摘要 |
PROBLEM TO BE SOLVED: To form an insulating interlayer consisting of a fluorocarbon polymer film of which the film density is controlled. SOLUTION: This film forming gas has 1 or more double bonds or one triple bond, and this plasma film-forming method includes using the film forming gas.
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| 申请公布号 |
JP2002220668(A) |
申请公布日期 |
2002.08.09 |
| 申请号 |
JP20010341576 |
申请日期 |
2001.11.07 |
| 申请人 |
DAIKIN IND LTD |
发明人 |
NAKAMURA SHINGO;ITANO MITSUSHI;AOYAMA HIROICHI |
| 分类号 |
C23C16/26;H01L21/312;(IPC1-7):C23C16/26 |
主分类号 |
C23C16/26 |
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