HIGH POLYMER COMPOUND, RESIST MATERIAL AND PATTERN- FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a resist material which is sensitive to high energy beams and excellent in the sensitivity at a wavelength of 200 nm or less, especially 170 nm or less and which improves an adhesion to a substrate and an alkali developability by introducing a fluorine-containing hydroxystyrene and a fluorine-containing acrylate unit and gives an excellent resolution. SOLUTION: The high polymer compound comprises a recurring unit represented by the formula (I) R1 is F or a fluorinated alkyl; R2 is H or an acid labile group; R3-R8 are H, F, an alkyl or a fluorinated alkyl; R9 is at least one group selected from an acid labile group, an adhesion group and a highly transparent group containing at least one fluorine atom; i and j are an integer; 0