| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum treatment method which improves a vacuum treatment speed, stably attains vacuum treatment performance with adequate reproducibility, and reduces vacuum treatment costs. SOLUTION: This method comprises, setting a cylindrical substrate (not shown) in a reactive vessel 140, decomposing the introduced source gas into the reactive vessel 140, by supplying several high frequency powers having different frequencies each other inside the reactive vessel 140 through a cathode electrode (not shown), generating plasma, and treating the cylindrical substrate. Then, a ratio of reflective power against incident power of at least one high frequency power among the several high frequency powers, is adjusted in the predetermined range.
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