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发明名称
Method of eching an aluminium metal film
摘要
<p>본 발명은 알루미늄 금속막 식각 방법에 관한 것으로, 염소를 이용하여 알루미늄 금속막을 식각하고 남은 잔유물에 의해 알루미늄 막이 부식되는 것을 막기위하여 HO 플라즈마 처리로 염소를 제거하므로써 알루미늄 금속막의 부식을 억제할 수 있는 알루미늄 금속막 식각 방법에 관한 것이다.</p>
申请公布号
KR100347540(B1)
申请公布日期
2002.08.07
申请号
KR19990060568
申请日期
1999.12.22
申请人
주식회사 하이닉스반도체
发明人
신강섭;백계현
分类号
H01L21/3065
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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