| 发明名称 |
Determination of center of focus by diffraction signature analysis |
| 摘要 |
The present invention provides methods for determination of parameters in lithographic devices and applications by diffraction signature difference analysis, including determination of center of focus in lithography devices and applications.
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| 申请公布号 |
US6429930(B1) |
申请公布日期 |
2002.08.06 |
| 申请号 |
US20010946104 |
申请日期 |
2001.09.04 |
| 申请人 |
ACCENT OPTICAL TECHNOLOGIES, INC. |
发明人 |
LITTAU MICHAEL E.;RAYMOND CHRISTOPHER J. |
| 分类号 |
G01M11/02;G03F7/20;H01L21/027;(IPC1-7):G01B9/00 |
主分类号 |
G01M11/02 |
| 代理机构 |
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