发明名称 Nitride semiconductor and a method thereof, a nitride semiconductor device and a method thereof
摘要 In a nitride semiconductor of BpAlqGarInsN (0<=p<=1, 0<=q<=1, 0<=r<=1, 0<=s<=1, p+q+r+s=1), in particular a p-type nitride compound semiconductor, a point defect concentration of the p-type semiconductors is set to 1x1019 cm-3 or more. This makes it possible to obtain a high carrier concentration at room temperature.
申请公布号 US6429032(B1) 申请公布日期 2002.08.06
申请号 US20000481122 申请日期 2000.01.11
申请人 SONY CORPORATION 发明人 OKUYAMA HIROYUKI;NAKAJIMA HIROSHI;NAKAMURA FUMIHIKO
分类号 H01L21/00;H01L21/205;H01L21/60;H01L33/00;H01L33/06;H01L33/32;H01S5/00;H01S5/323;H01S5/343;(IPC1-7):H01L21/60 主分类号 H01L21/00
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