发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DRIVE
摘要 PROBLEM TO BE SOLVED: To prevent troubles such as an open failure or an increase in connection resistance in an environment of high temperatures and humidity when a flip chip method is applied. SOLUTION: Lands 22 are formed on a wiring board 20, a tin (Sn) plating film 23 is formed on the lands 22, a semiconductor chip 11 where gold bumps 17 have been formed is mounted on the wiring board 20, and the gold bumps 17 are bonded to the tin plating film 23 by thermocompression. By this thermo- compression bonding, the lands 22 and the gold bumps 17 are electrically and mechanically connected together through a gold-tin eutectic layer formed of the tin plating film 23 and the gold bump 17. Therefore, the land and the gold bump are electrically and mechanically together with a gold-tin eutectic layer formed of the tin plating film and the gold bump, so that a trouble such as an open circuit or an increase in connection resistance can be prevented from occurring.
申请公布号 JP2002217232(A) 申请公布日期 2002.08.02
申请号 JP20010006375 申请日期 2001.01.15
申请人 HITACHI LTD 发明人 SHINODA MASAYOSHI
分类号 H01L21/60 主分类号 H01L21/60
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