发明名称 WAFER ABSORBING UNIT AND METHOD FOR FABRICATING PASSIVATION LAYER ON WAFER BY USING THE SAME
摘要 PURPOSE: A wafer absorbing unit is provided to form a thin deposition layer and to reduce passivation metal consumed by grinding, by making a wafer in direct contact with the passivation metal so that the layer is deposited through a preheating treatment process. CONSTITUTION: A position disc positions uniformly the wafer(11). A supporting unit fixes the position disc. A fixing ring for preventing the wafer moving is installed on the position disc. A preheating wire is disposed in the inner and outer circumference of the fixed ring. A temperature measuring unit controls the temperature of the preheating wire. A cross-type absorbing hole vacuum-absorbs the wafer and fixes the wafer inside the fixed ring.
申请公布号 KR20020057244(A) 申请公布日期 2002.07.11
申请号 KR20000087535 申请日期 2000.12.30
申请人 HYUNDAI DISPLAY TECHNOLOGY INC. 发明人 YOON, HYEON GUK
分类号 H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/68
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