发明名称 |
WAFER ABSORBING UNIT AND METHOD FOR FABRICATING PASSIVATION LAYER ON WAFER BY USING THE SAME |
摘要 |
PURPOSE: A wafer absorbing unit is provided to form a thin deposition layer and to reduce passivation metal consumed by grinding, by making a wafer in direct contact with the passivation metal so that the layer is deposited through a preheating treatment process. CONSTITUTION: A position disc positions uniformly the wafer(11). A supporting unit fixes the position disc. A fixing ring for preventing the wafer moving is installed on the position disc. A preheating wire is disposed in the inner and outer circumference of the fixed ring. A temperature measuring unit controls the temperature of the preheating wire. A cross-type absorbing hole vacuum-absorbs the wafer and fixes the wafer inside the fixed ring.
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申请公布号 |
KR20020057244(A) |
申请公布日期 |
2002.07.11 |
申请号 |
KR20000087535 |
申请日期 |
2000.12.30 |
申请人 |
HYUNDAI DISPLAY TECHNOLOGY INC. |
发明人 |
YOON, HYEON GUK |
分类号 |
H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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