COMPOSITION COMPRISING AN OXIDIZING AND COMPLEXING COMPOUND
摘要
The present invention is related to a composition comprising an oxidizing compound and a complexing compound with the chemical formula wherein R1, R2, R3 and R4 are selected from the group consisting of H and any organic side chain. The oxidizing compound can be in the form of an aqueous solution. The complexing compound is for complexing metal ions. Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate.
申请公布号
WO02051961(A2)
申请公布日期
2002.07.04
申请号
WO2001BE00219
申请日期
2001.12.21
申请人
INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM (IMEC);ASHLAND INC.;VOS, RITA;MERTENS, PAUL;FESTER, ALBRECHT;DOLL, OLIVER;KOLBESEN, BERND
